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Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium

Citation:

K. K. Berggren, R. Youkin, E. Cheung, M. G. Prentiss, A. J. Black, G. M. Whitesides, D. C. Ralph, C. T. Black, and M. Tinkham. 1997. “Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium.” Advanced Materials, 9, Pp. 52-55.
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See also: MATERIALS SCIENCE, Materials, SAMs, Silicon, Soft Lithography, Devices and Structures, Surfaces: SAMs, PE-CO2H, R2PtL2, Others, SAMs, Wetting, Materials-by-Design
Last updated on 02/15/2019