@article {1340678,
	title = {Using Neutral Metastable Argon Atoms and Contamination Lithography to Form Nanostructures in Silicon, Silicon Dioxide, and Gold},
	journal = {Applied Physics Letters},
	volume = {69},
	year = {1996},
	note = {521},
	pages = {2773-2775},
	author = {Johnson, K. S. and Berggren, K. K. and Black, A. J. and Black, C. T. and Chu, A. P. and Dekker, N. H. and Ralph, D. C. and Thywissen, J. H. and Youkin, R. and Prentiss, M. G. and Tinkham, M. and Whitesides, G. M.}
}
