@article {1340718,
	title = {Using an Elastomeric Phase Mask for sub-100 nm Photolithography in the Optical Near Field},
	journal = {Applied Physics Letters},
	volume = {70},
	year = {1997},
	note = {561},
	pages = {2658-2660},
	author = {Rogers, J. A. and Paul, K. E. and Jackman, R. J. and Whitesides, G. M.}
}
