@article {1340753,
	title = {Generating ~90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask},
	journal = {J. Vac. Sci. Technol. B},
	volume = {16},
	year = {1998},
	note = {596},
	pages = {59-68},
	author = {Rogers, J. A. and Paul, K. E. and Jackman, R. J. and Whitesides, G. M.}
}
