Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

Citation:

K. K. Berggren, A. Bard, J.L. Wilbur, J. D. Gillaspy, A. G. Helg, J. J. McClelland, S. L. Rolston, W. D. Phillips, M. G. Prentiss, and G. M. Whitesides. 1995. “Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers.” Science, 269, Pp. 1255-1257.
PDF445 KB

Notes:

466
Last updated on 02/15/2019