Citation:J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides. 1997. “Using an Elastomeric Phase Mask for sub-100 nm Photolithography in the Optical Near Field.” Applied Physics Letters, 70, Pp. 2658-2660.Download CitationBibTex Tagged XML Download PDF0 bytes Notes:561See also: MATERIALS SCIENCE, Materials, PDMS, Polymers: PDMS, Conducting Solids, AMPs, PDMS, Soft Lithography, Devices and Structures, Microcontact Printing, Micromolding, Optical SystemsLast updated on 01/23/2019