Publications by Author: Berggren, K. K.

K. K. Berggren, R. Youkin, E. Cheung, M. G. Prentiss, A. J. Black, G. M. Whitesides, D. C. Ralph, C. T. Black, and M. Tinkham. 1997. “Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium.” Advanced Materials, 9, Pp. 52-55. PDF
R. Younkin, K. K. Berggren, K. S. Johnson, M. G. Prentiss, D. C. Ralph, and G. M. Whitesides. 1997. “Nanostructure fabrication in silicon using cesium to pattern a self-assembled monolayer.” Applied Physics Letters, 71, Pp. 1261-1263. PDF
A. Bard, K. K. Berggren, J.L. Wilbur, J. D. Gillaspy, S. L. Rolston, J. J. McClelland, W. D. Phillips, M. G. Prentiss, and G. M. Whitesides. 1997. “Self-assembled monolayers exposed by metastable argon and metastable helium for neutral atom lithography and atomic beam imaging.” J. Vac. Sci. Technol. B, 15, Pp. 1805-1810. PDF
K. S. Johnson, K. K. Berggren, A. J. Black, C. T. Black, A. P. Chu, N. H. Dekker, D. C. Ralph, J. H. Thywissen, R. Youkin, M. G. Prentiss, M. Tinkham, and G. M. Whitesides. 1996. “Using Neutral Metastable Argon Atoms and Contamination Lithography to Form Nanostructures in Silicon, Silicon Dioxide, and Gold.” Applied Physics Letters, 69, Pp. 2773-2775. PDF
K. K. Berggren, A. Bard, J.L. Wilbur, J. D. Gillaspy, A. G. Helg, J. J. McClelland, S. L. Rolston, W. D. Phillips, M. G. Prentiss, and G. M. Whitesides. 1995. “Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers.” Science, 269, Pp. 1255-1257. PDF