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Publications by Author: Berggren, K. K.

1997
K. K. Berggren, R. Youkin, E. Cheung, M. G. Prentiss, A. J. Black, G. M. Whitesides, D. C. Ralph, C. T. Black, and M. Tinkham. 1997. “Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium.” Advanced Materials, 9, Pp. 52-55. PDF
538
R. Younkin, K. K. Berggren, K. S. Johnson, M. G. Prentiss, D. C. Ralph, and G. M. Whitesides. 1997. “Nanostructure fabrication in silicon using cesium to pattern a self-assembled monolayer.” Applied Physics Letters, 71, Pp. 1261-1263. PDF
545
A. Bard, K. K. Berggren, J.L. Wilbur, J. D. Gillaspy, S. L. Rolston, J. J. McClelland, W. D. Phillips, M. G. Prentiss, and G. M. Whitesides. 1997. “Self-assembled monolayers exposed by metastable argon and metastable helium for neutral atom lithography and atomic beam imaging.” J. Vac. Sci. Technol. B, 15, Pp. 1805-1810. PDF
530
1996
K. S. Johnson, K. K. Berggren, A. J. Black, C. T. Black, A. P. Chu, N. H. Dekker, D. C. Ralph, J. H. Thywissen, R. Youkin, M. G. Prentiss, M. Tinkham, and G. M. Whitesides. 1996. “Using Neutral Metastable Argon Atoms and Contamination Lithography to Form Nanostructures in Silicon, Silicon Dioxide, and Gold.” Applied Physics Letters, 69, Pp. 2773-2775. PDF
521
1995
K. K. Berggren, A. Bard, J.L. Wilbur, J. D. Gillaspy, A. G. Helg, J. J. McClelland, S. L. Rolston, W. D. Phillips, M. G. Prentiss, and G. M. Whitesides. 1995. “Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers.” Science, 269, Pp. 1255-1257. PDF
466