Citation:
J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides. 1998. “Generating ~90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask.” J. Vac. Sci. Technol. B, 16, Pp. 59-68.
971 KB |
971 KB |